DESCRIPTION
1600°C vacuum/atmosphere tube furnace CVD system (CVD-TF) provides an experimental environment with vacuum, controllable atmosphere and high temperature, and is used in semiconductor, nanotechnology, fiber and other fields. This CVD growth system is suitable for CVD process , such as silicon carbide coating, ceramic substrate conductivity test, controllable growth of ZnO nanostructure, ceramic capacitor (MLCC) atmosphere sintering and other experiments.